Thursday it had become the first company to assemble one of Dutch tech group ASML’s new “High NA EUV” lithography tools, an important part of the US computer chip maker’s drive to outshine rivals.
Lithography is one of many technologies chip makers use to improve chips, but it is a limiting factor in how small the features on a chip can be — smaller means faster and more energy efficient. Although the older DUV tools were cheaper, complex multi-patterning became too time consuming and led to too many faulty chips, slowing Intel’s commercial progress.The US company has now adopted first-generation EUV for the most crucial parts of its best chips, and Phillips said it expects the move to High NA EUV will be smoother.
Intel
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